%PDF-1.4
%
1 0 obj
<>stream
aip.orgtrue10.1063/1.50896612019-05-01Polytype control of MoS2 using chemical bath deposition
10.1063/1.5089661http://dx.doi.org/10.1063/1.5089661
VoR
doi:10.1063/1.5089661Polytype control of MoS2 using chemical bath depositionJenny K. HedlundAmy V. Walkerliquid phase depositionmolybdenum compoundsmonolayerspolymorphismRaman spectraself-assemblysemiconductor materialssemiconductor thin filmssurface energyX-ray photoelectron spectra
2019-05-01trueaip.org10.1063/1.5089661
endstream
endobj
2 0 obj
<>
endobj
3 0 obj
<>stream
xXM6ϯ" 33E{+ Kҿ_Rlږwt630%=|r;>3}~P|, yt>7)uMb6YdZ14cvz<]NoPd✋SBoqzx>`0ĉo:t6l3vF-L?t] }1%GJ,%QvF`n] QV]^Eͥ]l䉉0 ]LףʶƂ/8&c˙-|Qh DT ?q<#_dg|Y+(3P"=^|r9s}XܫĜ)F9#&hi0
}R ELB"g)8;W9(ŬϯjMssqrSM
>)nP\#ŃjPa"lrM"ډ$K@⌇"XB)E2Eq)H0FYkMv1YN42~<}D~#tM?#8鉦@ӯ4kr%eSL8
&xT*R/D^
پ cZP
)B!ʲ\b,襍\njC^:w6U'/k2ǁHܽc.u-}/q*0S}GR{/9ڷ
K-KꨲNɡTFR1JpH:z[bH3F
W]E\Nn"JhvB"vaRVzkehV5M7
`0д;2:g9̄*r߄nu`
W{i2:zZ0@ DKp4]Am(Ϊ,LxviL@q
CbO9 5~xZUyW=_d;Np Pph継PqnzXAUA; DR
"},6(U{NlY}q.L^dr
8sr[.p8XJZϯڝ$nyV&6E'xXϋ nvRr딅z9ǡ|ҩע*lhmj:$wGm]]7trn0t|mdgrc#/uwoAȆ>#*-BH
BЊlϯT4+`gVJ}VZv$~/I=IFFF$ꛒ$˙w#ߚ$K0tܓ$=Z^#HoyPqpzDUv~Cz!/D?z3Wf?h-
endstream
endobj
4 0 obj
<>/ProcSet[/PDF/ImageB/ImageC/Text]/Font<>/XObject<>>>
endobj
7 0 obj
[/ICCBased 22 0 R]
endobj
22 0 obj
<>stream
xwXSsN`$!l{@ ٢ $@TR)XZԉ(
RZD|y L0V@(#q `= nnWXX0+Зȕ;ѫ R1{Ol (Lγx\䜙/V'LKP0RX~@9k(8u?̰yBOΑr y
<)_Έ"<?_l)
F+s9H
MI #~__ Q$.R$sŅg%f,a6GTLΟEQԖ!/Bſ)EogEA?l kJ^-ؒ \?l{ P&d\EAt{6~/ÇfJq2bFn6g0<8aO"yD|TyE