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    Nucleation and Growth of WSe₂: Enabling Large Grain Transition Metal Dichalcogenides 

    Yue, Ruoyu; Nie, Yifan; Walsh, Lee A.; Addou, Rafik; Liang, Chaoping; Lu, Ning; Barton, Adam T.; Zhu, Hui; Che, Zifan; Barrera, Diego; Cheng, Lanxia; Cha, Pil-Ryung; Chabal, Yves J.; Hsu, Julia W. P.; Kim, Jiyoung; Kim, Moon J.; Colombo, Luigi; Wallace, Robert M.; Cho, Kyeongjae; Hinkle, Christopher L. (IOP Publishing Ltd, 2017-09-22)
    The limited grain size (< 200 nm) for transition metal dichalcogenides (TMDs) grown by molecular beam epitaxy (MBE) reported in the literature thus far is unsuitable for high-performance device applications. In this work, ...

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    AuthorAddou, Rafik (1)Barrera, Diego (1)Barton, Adam T. (1)Cha, Pil-Ryung (1)Chabal, Yves J. (1)Che, Zifan (1)Cheng, Lanxia (1)Cho, Kyeongjae (1)Colombo, Luigi (1)Hinkle, Christopher L. (1)... View MoreSubjectEpitaxy (1)Field-effect transistors (1)Molecular beam epitaxy (1)Molybdenum disulfide (1)Monte Carlo method (1)Scanning tunneling microscopy (1)Selenium (1)Semiconductors (1)Thin films (1)Tungsten diselenide, transition metal dichalcogenides, van der waals epitaxy, nucleation and growth, kinetic monte carlo simulation (1)... View MoreDate Issued
    2017 (1)
    Has File(s)Yes (1)

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