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    • Erik Jonsson School of Engineering and Computer Science
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    High-κ Dielectric on ReS₂: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al₂O₃ 

    Khosravi, Ava; Addou, Rafik; Catalano, Massimo; Kim, Jiyoung; Wallace, Robert M. (MDPI AG, 2019-03-30)
    We report an excellent growth behavior of a high-κ dielectric on ReS₂ , a two-dimensional (2D) transition metal dichalcogenide (TMD). The atomic layer deposition (ALD) of an Al₂O₃ thin film on the UV-Ozone pretreated surface ...

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    AuthorAddou, Rafik (1)Catalano, Massimo (1)Khosravi, Ava (1)Kim, Jiyoung (1)Wallace, Robert M. (1)SubjectAluminum oxide (1)Atomic force microscopy (1)
    Atomic layer deposition (Plasma-enhanced) (1)
    Indium compounds (1)Morphology (1)Ozone (1)Photoelectrons (1)Photons (1)Rhenium compounds (1)Rhenium sulfide (1)... View MoreDate Issued
    2019 (1)
    Has File(s)Yes (1)

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