Walker, Amy V.
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Amy Walker is an Associate Professor in the Department of Materials Science and Engineering. Her research interests include: "Physical chemistry, analytical chemistry, surface science, materials science, nanoscience, catalysis, metal-organic thin films, new methods for the deposition of metals and other materials on organic surfaces, patterning of organic surfaces, molecular electronics, time-of-flight secondary ion mass spectrometry (TOF SIMS), mass spectrometric imaging." More information about Dr. Walker can be found here.
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Recent Submissions
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Polytype Control of MoS₂ Using Chemical Bath Deposition
(American Institute of Physics Inc., 2019-05-01)Molybdenum disulfide (MoS₂) has a wide range of applications from electronics to catalysis. While the properties of single-layer and multilayer MoS₂ films are well understood, controlling the deposited MoS₂ polytype remains ... -
Law and Disorder: Special Stacking Units—Building the Intergrowth Ce₆ Co₅ Ge₁₆
(American Chemical Society, 2019-04-22)A new structure type of composition Ce₆ Co₅ Ge₁₆ was grown out of a molten Sn flux. Ce₆ Co₅ Ge₁₆ crystallizes in the orthorhombic space group Cmcm, with highly anisotropic lattice parameters of α = 4.3293(5) Å, b = 55.438(8) ... -
Toward Understanding Weak Matrix Effects in TOF SIMS
Chemical imaging methods, including imaging mass spectrometry, are increasingly used for the analysis of samples ranging from biological tissues to electronic devices. A barrier to wider adoption of imaging mass spectrometry ... -
Application of Visible-Light Photosensitization to Form Alkyl-Radical-Derived Thin Films on Gold
Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)₃]²⁺ and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. ... -
Photochemical CVD of Ru on Functionalized Self-Assembled Monolayers from Organometallic Precursors
(American Institute of Physics Inc, 2018-08-20)Chemical vapor deposition (CVD) is an attractive technique for the metallization of organic thin films because it is selective and the thickness of the deposited film can easily be controlled. However, thermal CVD processes ... -
Room Temperature Atomic Layerlike Deposition of ZnS on Organic Thin Films: Role of Substrate Functional Groups and Precursors
The room temperature atomic layerlike deposition (ALLD) of ZnS on functionalized self-assembled monolayers (SAMs) was investigated, using diethyl zinc (DEZ) and in situ generated H₂S as reactants. Depositions on SAMs with ... -
Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials
The partially fluorinated oxo-alkoxide tungsten(VI) complexes WO(OR) 4 [4; R = C(CH3)2CF3, 5; R = C(CH3)(CF3)2] have been synthesized as precursors for chemical vapour deposition (CVD) of WOx nanocrystalline material. ...