Browsing Thamban, P. L. Stephan by Author "0000 0001 2766 4681 (Thamban, PLS)"
Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy Thamban, P. L. Steven; Padron-Wells, Gabriel; Hosch, Jimmy W.; Yun, Stuart; Goeckner, Matthew J. (American Vacuum Society, 2012-10-03)Use the DOI persistent link to see the abstract. A subscription or fee may be necessary to view the article.
Stephan Thamban, P. L., 1975-; Padron-Wells, Gabriel; Yun, Stuart; Hosch, Jimmy W.; Goeckner, Matthew J.In process optical emission spectroscopy (OES) measurements, excitation mechanisms as dictated by the process plasma can be complex to analyze optical signals quantitatively. Applications of a new electron beam excitation ...
Bates, Robert L.; Thamban, P. L. Stephan; Goeckner, Matthew J.; Overzet, Lawrence J.While plasmas using mixtures of SF₆, C₄F₈, and Ar are widely used in deep silicon etching, very few studies have linked the discharge parameters to etching results. The authors form such linkages in this report. The authors ...