Browsing Thamban, P. L. Stephan by Issue Date
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Comparison endpoint study of process plasma and secondary electron beam exciter optical emission spectroscopy (American Vacuum Society, 2012-10-03)Use the DOI persistent link to see the abstract. A subscription or fee may be necessary to view the article.
While plasmas using mixtures of SF₆, C₄F₈, and Ar are widely used in deep silicon etching, very few studies have linked the discharge parameters to etching results. The authors form such linkages in this report. The authors ...
In process optical emission spectroscopy (OES) measurements, excitation mechanisms as dictated by the process plasma can be complex to analyze optical signals quantitatively. Applications of a new electron beam excitation ...