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    • Electron Beam Excitation Method to Study Gas Phase During Etch Processes 

      Stephan Thamban, P. L., 1975-; Padron-Wells, Gabriel; Yun, Stuart; Hosch, Jimmy W.; Goeckner, Matthew J.
      In process optical emission spectroscopy (OES) measurements, excitation mechanisms as dictated by the process plasma can be complex to analyze optical signals quantitatively. Applications of a new electron beam excitation ...