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    Film Formation Mechanisms and Interfacial Interactions Derived from In-Situ Fourier-Transform Infrared Spectroscopy and Ex-Situ XPS 

    Dangerfield, Aaron M. (2018-08)
    There is a trend toward the miniaturization of devices for a multitude of industries (microelectronic, energy harvesting/collecting, sensing, etc.) to decrease production costs, increase yields and to optimize efficiencies. ...
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    Single Particle Spectroscopy of Quantum Dots and Energy Transfer from Quantum Dots into Silicon and TMDCs 

    Guo, Tianle (2019-05)
    Semiconductor nanocrystal quantum dots (NQDs) have long demonstrated potential in a broad range of optoelectronics applications such as lasers, light-emitting diodes (LEDs), photovoltaic solar cells, photo- and biosensors, ...
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    Resolving Nitrogen Bases in Single Stranded DNA with Hexagonal Boron Nitride/ ALD TiO₂ Nanopores 

    Oviedo Robles, Juan Pablo (2017-12)
    Recent advances in the synthesis and quality of 2D materials within the last decade, such as graphene and MoS₂, have led to a new generation of solid state nanopore DNA sequencing devices with improved sub-nanometer spatial ...
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    In Situ Studies of the Surface Chemistry Reactions Involved in Gas-Phase Deposition and Etching of Thin Dielectric Films 

    Pena Orduna, Luis Fabian (2018-08)
    In this dissertation, key aspects of the surface chemistry associated with gas phase deposition and etching are discussed. Atomic layer deposition (ALD) is a gas-phase deposition technique primarily known for its superior ...
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    Mechanistic Studies of Atomic Layer Deposition and Thermal Atomic Layer Etching Processes of Various Oxide Thin Films 

    Rahman, Rezwanur (2018-12)
    Atomic layer deposition (ALD) and atomic layer etching (ALE) will be the key techniques for sub10 nm node technology. Establishing a mechanistic understanding of the underlying surface chemistry is crucial for the ...
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    High Mobility III-V Semiconductor Devices with Gate Dielectrics and Passivation Layers Grown by Atomic Layer Deposition 

    Meng, Xin (2018-05)
    This dissertation focuses on the applications of atomic layer deposition (ALD) to high mobility III-V semiconductor devices. The first study is an in situ ALD-based interface passivation technique using ALD diethylzinc ...

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    AuthorDangerfield, Aaron M. (1)Guo, Tianle (1)Meng, Xin (1)Oviedo Robles, Juan Pablo (1)Pena Orduna, Luis Fabian (1)Rahman, Rezwanur (1)Subject
    Atomic layer deposition (6)
    Fourier transform infrared spectroscopy (2)Plasma-enhanced chemical vapor deposition (2)Quantum dots (2)Silicon nitride (2)Surface chemistry (2)X-ray photoelectron spectroscopy (2)Boron nitride (1)Chalcogenides (1)Crystalline interfaces (1)... View MoreDate Issued2018 (4)2017 (1)2019 (1)Has File(s)Yes (6)

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