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Film Formation Mechanisms and Interfacial Interactions Derived from In-Situ Fourier-Transform Infrared Spectroscopy and Ex-Situ XPS
(2018-08)
There is a trend toward the miniaturization of devices for a multitude of industries
(microelectronic, energy harvesting/collecting, sensing, etc.) to decrease production costs,
increase yields and to optimize efficiencies. ...
Single Particle Spectroscopy of Quantum Dots and Energy Transfer from Quantum Dots into Silicon and TMDCs
(2019-05)
Semiconductor nanocrystal quantum dots (NQDs) have long demonstrated potential in a
broad range of optoelectronics applications such as lasers, light-emitting diodes (LEDs), photovoltaic solar cells, photo- and biosensors, ...
Resolving Nitrogen Bases in Single Stranded DNA with Hexagonal Boron Nitride/ ALD TiO₂ Nanopores
(2017-12)
Recent advances in the synthesis and quality of 2D materials within the last decade, such as graphene and MoS₂, have led to a new generation of solid state nanopore DNA sequencing devices with improved sub-nanometer spatial ...
In Situ Studies of the Surface Chemistry Reactions Involved in Gas-Phase Deposition and Etching of Thin Dielectric Films
(2018-08)
In this dissertation, key aspects of the surface chemistry associated with gas phase deposition and etching are discussed. Atomic layer deposition (ALD) is a gas-phase deposition technique primarily known for its superior ...
Mechanistic Studies of Atomic Layer Deposition and Thermal Atomic Layer Etching Processes of Various Oxide Thin Films
(2018-12)
Atomic layer deposition (ALD) and atomic layer etching (ALE) will be the key techniques for sub10 nm node technology. Establishing a mechanistic understanding of the underlying surface
chemistry is crucial for the ...
High Mobility III-V Semiconductor Devices with Gate Dielectrics and Passivation Layers Grown by Atomic Layer Deposition
(2018-05)
This dissertation focuses on the applications of atomic layer deposition (ALD) to high mobility III-V semiconductor devices. The first study is an in situ ALD-based interface passivation technique using ALD diethylzinc ...