Now showing items 1-4 of 4
Film Formation Mechanisms and Interfacial Interactions Derived from In-Situ Fourier-Transform Infrared Spectroscopy and Ex-Situ XPS
There is a trend toward the miniaturization of devices for a multitude of industries (microelectronic, energy harvesting/collecting, sensing, etc.) to decrease production costs, increase yields and to optimize efficiencies. ...
In Situ Studies of the Surface Chemistry Reactions Involved in Gas-Phase Deposition and Etching of Thin Dielectric Films
In this dissertation, key aspects of the surface chemistry associated with gas phase deposition and etching are discussed. Atomic layer deposition (ALD) is a gas-phase deposition technique primarily known for its superior ...
Mechanistic Studies of Atomic Layer Deposition and Thermal Atomic Layer Etching Processes of Various Oxide Thin Films
Atomic layer deposition (ALD) and atomic layer etching (ALE) will be the key techniques for sub10 nm node technology. Establishing a mechanistic understanding of the underlying surface chemistry is crucial for the ...
High Mobility III-V Semiconductor Devices with Gate Dielectrics and Passivation Layers Grown by Atomic Layer Deposition
This dissertation focuses on the applications of atomic layer deposition (ALD) to high mobility III-V semiconductor devices. The first study is an in situ ALD-based interface passivation technique using ALD diethylzinc ...