Now showing items 1-2 of 2
In Situ Studies of the Surface Chemistry Reactions Involved in Gas-Phase Deposition and Etching of Thin Dielectric Films
In this dissertation, key aspects of the surface chemistry associated with gas phase deposition and etching are discussed. Atomic layer deposition (ALD) is a gas-phase deposition technique primarily known for its superior ...
Mechanistic Studies of Atomic Layer Deposition and Thermal Atomic Layer Etching Processes of Various Oxide Thin Films
Atomic layer deposition (ALD) and atomic layer etching (ALE) will be the key techniques for sub10 nm node technology. Establishing a mechanistic understanding of the underlying surface chemistry is crucial for the ...