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Film Formation Mechanisms and Interfacial Interactions Derived from In-Situ Fourier-Transform Infrared Spectroscopy and Ex-Situ XPS
There is a trend toward the miniaturization of devices for a multitude of industries (microelectronic, energy harvesting/collecting, sensing, etc.) to decrease production costs, increase yields and to optimize efficiencies. ...
Mechanistic Studies of Atomic Layer Deposition and Thermal Atomic Layer Etching Processes of Various Oxide Thin Films
Atomic layer deposition (ALD) and atomic layer etching (ALE) will be the key techniques for sub10 nm node technology. Establishing a mechanistic understanding of the underlying surface chemistry is crucial for the ...