Application of Visible-Light Photosensitization to Form Alkyl-Radical-Derived Thin Films on Gold

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dc.contributor.authorQuarels, Rashanique D.en_US
dc.contributor.authorZhai, Xianglinen_US
dc.contributor.authorKuruppu, Neepaen_US
dc.contributor.authorHedlund, Jenny K.en_US
dc.contributor.authorEllsworth, Ashley A.en_US
dc.contributor.authorWalker, Amy V.en_US
dc.contributor.authorGarno, Jayne C.en_US
dc.contributor.authorRagains, Justin R.en_US
dc.contributor.utdAuthorHedlund, Jenny K.en_US
dc.contributor.utdAuthorEllsworth, Ashley A.en_US
dc.contributor.utdAuthorWalker, Amy V.en_US
dc.date.accessioned2018-09-24T15:41:45Z
dc.date.available2018-09-24T15:41:45Z
dc.date.created2017-09-06en_US
dc.descriptionIncludes supplementary materialen_US
dc.description.abstractVisible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)₃]²⁺ and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis of small organic molecules. Herein, we demonstrate for the first time the visible-light photosensitized deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles. Analysis with AFM demonstrated that the films are robust and resistant to mechanical force while contact angle goniometry suggests a multilayered and disordered film structure. Analysis with IRRAS, XPS, and TOF SIMS provides further insights.en_US
dc.description.departmentErik Jonsson School of Engineering and Computer Scienceen_US
dc.description.sponsorshipNational Science Foundation (CHE-1213546); Louisiana Board of Regents (LEQSF-(2014-16)-ENH-TR-03 and LEQSF-(2013-16)-RD-A-03).en_US
dc.identifier.bibliographicCitationQuarels, Rashanique D., Xianglin Zhai, Neepa Kuruppu, Jenny K. Hedlund, et al. 2017. "Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold." 8, doi:10.3762/bjnano.8.187doi:en_US
dc.identifier.issn2190-4286en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/6125
dc.identifier.volume8en_US
dc.relation.urihttp://dx.doi.org/10.3762/bjnano.8.187en_US
dc.rightsCC BY 4.0 (Attribution)en_US
dc.rights©2017 The Authorsen_US
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/en_US
dc.source.journalBeilstein Journal of Nanotechnologyen_US
dc.subjectAtomic force microscopyen_US
dc.subjectThin filmsen_US
dc.subjectparticle lithographyen_US
dc.subjectphotosensitizationen_US
dc.subjectTOF SIMSen_US
dc.titleApplication of Visible-Light Photosensitization to Form Alkyl-Radical-Derived Thin Films on Golden_US
dc.type.genrearticleen_US

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