Electron Beam Excitation Method to Study Gas Phase During Etch Processes

dc.contributor.ISNI0000 0000 5396 3610 (Goeckner, MJ)
dc.contributor.ISNI0000 0001 2766 4681 (Thamban, PLS)
dc.contributor.LCNA2008008261‏ (Goeckner, MJ)
dc.contributor.authorStephan Thamban, P. L., 1975-en_US
dc.contributor.authorPadron-Wells, Gabrielen_US
dc.contributor.authorYun, Stuarten_US
dc.contributor.authorHosch, Jimmy W.en_US
dc.contributor.authorGoeckner, Matthew J.en_US
dc.date.accessioned2014-02-13T19:39:58Z
dc.date.available2014-02-13T19:39:58Z
dc.date.created2012-5-18en_US
dc.description"The authors thank the funding organizations, NSF (CBET-0922962) and Verity Instruments, Inc. for granting the financial award for this project."en_US
dc.description.abstractIn process optical emission spectroscopy (OES) measurements, excitation mechanisms as dictated by the process plasma can be complex to analyze optical signals quantitatively. Applications of a new electron beam excitation method demonstrate distinct merits for plasma process diagnostics and process control. The electron energy control attribute of the method provides the means to optimize and monitor specific species optical emission in process chemistries to achieve process control such as endpoint. The authors present gas phase results from photoresist ash and SiO2 etch using O-2 and CF4/Ar discharges, respectively. The effluent density variations as measured with the e-beam method during process stages demonstrate process endpoint detection. Simultaneous measurements with FTIR spectroscopy and direct plasma OES is also presented for comparison.en_US
dc.identifier.citationStephan Thamban, P. L. , Gabriel Padron-Wells, Stuart Yun, Jimmy W. Hosch, et al. 2012. "Electron beam excitation method to study gas phase during etch processes." Journal of Vacuum Science & Technology B 30(4): 041201.en_US
dc.identifier.issn1071-1023en_US
dc.identifier.issue4en_US
dc.identifier.startpage41201en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/3053
dc.identifier.volume30en_US
dc.relation.urihttp://dx.doi.org/10.1116/1.4718724en_US
dc.rights© 2012 American Vacuum Societyen_US
dc.source.journalJournal of Vacuum Science & Technology Ben_US
dc.subjectElectron beam cuttingen_US
dc.subjectFourier transform infrared spectroscopyen_US
dc.subjectElectric dischargesen_US
dc.subjectEmission spectroscopyen_US
dc.subjectPhotoresistsen_US
dc.titleElectron Beam Excitation Method to Study Gas Phase During Etch Processesen_US
dc.typetexten_US
dc.type.genrearticleen_US

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