In situ atomic layer deposition half cycle study of Al2O 3 growth on AlGaN
dc.contributor.VIAF | 70133685 (Kim, J) | |
dc.contributor.author | Brennan, Barry | en_US |
dc.contributor.author | Qin, Xiaoye | en_US |
dc.contributor.author | Dong, Hong | en_US |
dc.contributor.author | Kim, Jiyoung | en_US |
dc.contributor.author | Wallace, Robert M. | en_US |
dc.date.accessioned | 2013-01-15T17:34:25Z | |
dc.date.available | 2013-01-15T17:34:25Z | |
dc.date.created | 2012-11-10 | en_US |
dc.date.issued | 2012-11-10 | en_US |
dc.description.abstract | Use the DOI address to see the article abstract. A subscription or fee may be necessary to view the article. | en_US |
dc.description.version | Final published version | en_US |
dc.identifier.bibliographicCitation | Brennan, B., X. Qin, H. Dong, J. Kim, and R.M. Wallace. “In Situ Atomic Layer Deposition Half Cycle Study of Al2O 3 Growth on AlGaN.” Applied Physics Letters 101, no. 21 (2012). | en_US |
dc.identifier.uri | http://hdl.handle.net/10735.1/2500 | |
dc.publisher | American Institute of Physics | en_US |
dc.relation.uri | http://dx.doi.org/10.1063/1.4767520 | en_US |
dc.rights | © 2012 American Institute of Physics. This article may be downloaded for personal use only. | en_US |
dc.source.journal | Applied Physics Letters | en_US |
dc.subject | Atomic layer deposition | en_US |
dc.subject | X-ray photoelectron spectroscopy. | en_US |
dc.subject | Atomic layer deposition | en_US |
dc.title | In situ atomic layer deposition half cycle study of Al2O 3 growth on AlGaN | en_US |
dc.type | Text | en_US |
dc.type.genre | article | en_US |