Gallium Oxide Semiconductor MOS Capacitors With Atomic Layer Deposited High-K Dielectrics

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dc.contributor.advisorYoung, Chadwin D.
dc.contributor.advisorLu, Hongbing
dc.contributor.committeeMemberQuevedo-Lopez, Manuel
dc.contributor.committeeMemberVandenberghe, William
dc.contributor.committeeMemberKetterson, Andrew
dc.creatorHawkins, Roberta Claire
dc.date.accessioned2023-05-25T19:28:05Z
dc.date.available2023-05-25T19:28:05Z
dc.date.created2022-12
dc.date.issued2022-12-01T06:00:00.000Z
dc.date.submittedDecember 2022
dc.date.updated2023-05-25T19:28:06Z
dc.description.abstractBeta-Gallium Oxide (β-Ga2O3) has garnered significant interest as a semiconductor for high-power and optical devices because of its wide bandgap and its availability in wafer form, in addition to supporting a wide range of epitaxial materials with various dopants. A variety of dielectric materials are available for creating MOS devices using β-Ga2O3 substrates. A suitable dielectric must have a high dielectric constant and a sufficient bandgap offset to prevent Fowler-Nordheim or direct tunneling of electrons. Al2O3, SiO2, and HfO2 are potential candidates due to relatively high band offsets with β-Ga2O3 and conceivable ease of integration. This work is composed of several studies which investigate the effects of surface treatments, such as chemical cleaning, plasma etching, or heat treatments of the β-Ga2O3/ dielectric interface, on MOS capacitor performance using capacitance-voltage and current-voltage analysis techniques. The purpose of this research is to contribute to the overall development of β-Ga2O3 technology especially in the areas of dielectric interfaces and oxide reliability.
dc.format.mimetypeapplication/pdf
dc.identifier.uri
dc.identifier.urihttps://hdl.handle.net/10735.1/9698
dc.language.isoen
dc.subjectEngineering, Materials Science
dc.titleGallium Oxide Semiconductor MOS Capacitors With Atomic Layer Deposited High-K Dielectrics
dc.typeThesis
dc.type.materialtext
thesis.degree.collegeSchool of Engineering and Computer Science
thesis.degree.departmentMaterials Science and Engineering
thesis.degree.grantorThe University of Texas at Dallas
thesis.degree.namePHD

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