Observations while attempting to fabricate a micro-electron detection system

Date

2016-12

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Abstract

Over the past 20 years, Micro-Electromechanical Systems (MEMS) influence typical daily activities and have become integrated in everyday life. Fabrication of such devices on the micro- and nano-scale is made possible with plasma technology. In this thesis, an attempt to fabricate a micro-scale Electron Detection System (mEDS) is discussed. This device, in theory, would advance fundamental understanding of what happens on a surface of a semiconductor in the presence of an electric field. The mEDS would bias potentials so that an ion-surface interaction would occur in the presence of an electric field while not affecting the ion’s energy appreciably. The following work reports on the observations of different steps during the fabrication of the mEDS. More specifically the chemical reactions and compressive stress during the wet etch (Chapter 3), high leakage current through the insulator layers (Chapter 4) and lithography interference issues (Chapter 5). Some issues were resolved while others are still being corrected at the time of this writing.

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Microelectromechanical systems, Electrons—Emission, Hydrofluoric acid, Chemical reactions, Mechanical chemistry, Photolithography

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Copyright ©2016 is held by the author. Digital access to this material is made possible by the Eugene McDermott Library. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.

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