Sensitivity of High-k Encapsulated MoS₂ Transistors to I-V Measurement Execution Time
dc.contributor.author | Bolshakov, Pavel | |
dc.contributor.author | Khosravi, Ava | |
dc.contributor.author | Zhao, Peng | |
dc.contributor.author | Wallace, Robert M. | |
dc.contributor.author | Young, Chadwin D. | |
dc.contributor.author | Hurley, P. K. | |
dc.contributor.utdAuthor | Bolshakov, Pavel | |
dc.contributor.utdAuthor | Khosravi, Ava | |
dc.contributor.utdAuthor | Zhao, Peng | |
dc.contributor.utdAuthor | Wallace, Robert M. | |
dc.contributor.utdAuthor | Young, Chadwin D. | |
dc.date.accessioned | 2019-10-18T21:31:17Z | |
dc.date.available | 2019-10-18T21:31:17Z | |
dc.date.created | 2018-03 | |
dc.description | Full text access from Treasures at UT Dallas is restricted to current UTD affiliates (use the provided Link to Article). | |
dc.description.abstract | High-k encapsulated MoS₂ field-effect-transistors were fabricated and electrically characterized. Comparison between HfO₂ and Al₂O₃ encapsulated MoS₂ FETs and their I-V response to execution time are shown. Changes in gate voltage step and integration time demonstrate that electrical characterization parameters can significantly impact device parameters such as the subthreshold swing and the threshold voltage. © 2018 IEEE. | |
dc.description.department | Erik Jonsson School of Engineering and Computer Science | |
dc.identifier.bibliographicCitation | Bolshakov, P., A. Khosravi, P. Zhao, R. M. Wallace, et al. 2018. "Sensitivity of high-k encapsulated MoS₂ transistors to I-V measurement execution time." 2018 IEEE International Conference on Microelectronic Test Structures: 161-165, doi: 10.1109/ICMTS.2018.8383789 | |
dc.identifier.isbn | 9781538650691 | |
dc.identifier.uri | https://hdl.handle.net/10735.1/7018 | |
dc.language.iso | en | |
dc.publisher | Institute of Electrical and Electronics Engineers Inc. | |
dc.relation.isPartOf | 2018 IEEE International Conference on Microelectronic Test Structures | |
dc.relation.uri | http://dx.doi.org/10.1109/ICMTS.2018.8383789 | |
dc.rights | ©2018 IEEE | |
dc.subject | Electric fields | |
dc.subject | Hafnium compounds | |
dc.subject | Semiconductors | |
dc.subject | Microelectronics | |
dc.subject | Molybdenum compounds | |
dc.subject | Electromotive force | |
dc.subject | Field-effect transistors | |
dc.title | Sensitivity of High-k Encapsulated MoS₂ Transistors to I-V Measurement Execution Time | |
dc.type.genre | article |
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