Tensile Strained Ge Tunnel Field-Effect Transistors: K . P Material Modeling and Numerical Device Simulation

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Abstract

Group IV based tunnel field-effect transistors generally show lower on-current than III-V based devices because of the weaker phonon-assisted tunneling transitions in the group IV indirect bandgap materials. Direct tunneling in Ge, however, can be enhanced by strain engineering. In this work, we use a 30-band k.p method to calculate the band structure of biaxial tensile strained Ge and then extract the bandgaps and effective masses at Γ and L symmetry points in k-space, from which the parameters for the direct and indirect band-to-band tunneling (BTBT) models are determined. While transitions from the heavy and light hole valence bands to the conduction band edge at the L point are always bridged by phonon scattering, we highlight a new finding that only the light-holelike valence band is strongly coupling to the conduction band at the Γ point even in the presence of strain based on the 30-band k.p analysis. By utilizing a Technology Computer Aided Design simulator equipped with the calculated band-to-band tunneling BTBT models, the electrical characteristics of tensile strained Ge point and line tunneling devices are self-consistently computed considering multiple dynamic nonlocal tunnel paths. The influence of field-induced quantum confinement on the tunneling onset is included. Our simulation predicts that an on-current up to 160 (260) μA/μm can be achieved along with on/off ratio > 10(6) for V-DD - 0.5V by the n-type (p-type) line tunneling device made of 2.5% biaxial tensile strained Ge.

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Keywords
Germanium, Silicon, Field-effect transistors (FET), Physics
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©2014 AIP Publishing LLC
Citation
Kao, Kuo-Hsing, Anne S. Verhulst, Maarten Van de Put, William G. Vandenberghe, et al. 2014. "Tensile strained Ge tunnel field-effect transistors: k . p material modeling and numerical device simulation." Journal of Applied Physics 115(4): 044505 1-8.