Driving Frequency Fluctuations in Pulsed Capacitively Coupled Plasmas

dc.contributor.ISNI0000 0000 5396 3610 (Goeckner, MJ)en_US
dc.contributor.ISNI0000 0003 5379 4329 (Overzet, LJ)en_US
dc.contributor.VIAF2267467 (Goeckner, MJ)en_US
dc.contributor.authorPoulose, Johnen_US
dc.contributor.authorGoeckner, Matthew J.en_US
dc.contributor.authorShannon, Stevenen_US
dc.contributor.authorCoumou, Daviden_US
dc.contributor.authorOverzet, Lawrence J.en_US
dc.contributor.utdAuthorPoulose, Johnen_US
dc.contributor.utdAuthorGoeckner, Matthew J.en_US
dc.contributor.utdAuthorOverzet, Lawrence J.en_US
dc.date.accessioned2018-09-24T15:30:46Z
dc.date.available2018-09-24T15:30:46Z
dc.date.created2017-09-26en_US
dc.descriptionFull text access from Treasures at UT Dallas is available only to current UTD affiliates.en_US
dc.description.abstractWe report time resolved measurements of the RF current, voltage and complex impedance for pulsed plasmas through electropositive (Ar) and electronegative (CF₄, O₂) gases and gas mixtures. In addition, we report measurements of the effective frequency versus time at various locations within the RF circuitry. The frequency is found to fluctuate away from that sourced by the RF generator when the plasma re-ignites. Plasma re-ignition induces abrupt impedance changes due to the re-formation of the plasma sheath and bulk. These fast changes in the plasma impedance cause the measured changes in the voltage and current frequencies. As a result, the frequency of the RF power at the plasma electrodes was found to be as much as 250 kHz different from that being sourced by the RF generator for short periods of time. These frequency fluctuations are of particular interest to the application of frequency tuned matching networks.en_US
dc.description.departmentSchool of Natural Sciences and Mathematicsen_US
dc.description.departmentErik Jonsson School of Engineering and Computer Scienceen_US
dc.description.sponsorshipNational Science Foundation under Grant No. NSF IIP1338917; NSF/DOE partnership in basic plasma science under grant NSF PHY1338917.en_US
dc.identifier.bibliographicCitationPoulose, John, Matthew J. Goeckner, Steven Shannon, David Coumou, et al. 2017. "Driving frequency fluctuations in pulsed capacitively coupled plasmas." European Physical Journal D 71(9), doi:10.1140/epjd/e2017-80096-7en_US
dc.identifier.issn1434-6060en_US
dc.identifier.issue9en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/6112
dc.identifier.volume71en_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.relation.urihttp://dx.doi.org/10.1140/epjd/e2017-80096-7en_US
dc.rights©2017 EDP Sciencesen_US
dc.source.journalEuropean Physical Journal Den_US
dc.subjectQuartz crystalsen_US
dc.subjectImpedance (Electricity)en_US
dc.subjectRadio frequencyen_US
dc.titleDriving Frequency Fluctuations in Pulsed Capacitively Coupled Plasmasen_US
dc.type.genrearticleen_US

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
JECS-3054-LINK-8243.35.pdf
Size:
94.84 KB
Format:
Adobe Portable Document Format
Description:
Link to Article