Electroless Deposition of Nanostructures on Micropatterned Substrates




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A key challenge in the practical application of nanostructures is their effective integration through assembly, patterning and alignment on technologically relevant substrates. Electroless nanowire deposition on micropatterned substrates (ENDOM) is a technique by which to simultaneously synthesize and place nanowires on chemically patterned substrates. Alkanethiol self-assembled monolayers (SAMs) have a highly organized crystalline structure with a uniform density of terminal functional groups. The SAM is used as a model system in this work. The nanowires can be precisely oriented on this surface in arbitrary shapes, such as an arch and around a right angle bend. In ENDOM, the shape of the deposit is controlled by the substrate pattern while its width is controlled by the reaction conditions. By employing longer deposition times and the appropriate substrate patterns, nanopores and nanochannels can be produced. The effects of amine-borane reducing agents and triethanolamine complexing agents in the deposition process are investigated. This allows for conditions such as the uniformity of nanoparticle deposition and surface selectivity to be optimized. Furthermore, ways to mitigate the penetration of copper through the monolayer are studied. The adhesion of the nanostructures to the substrate can be adjusted by altering the concentration of triethanolamine in solution, allowing them to be transferred to other types of technologically relevant substrates such as poly(methyl methacrylate) and silicon dioxide. Finally, it is shown that ENDOM can be used to create more complex structures such as nanowire crossbars.



Electroless plating, Nanostructures, Surface chemistry, Self-assembly (Chemistry), Monomolecular films, Nanowires



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