Choi, Kyung-HakHuh, J.Cui, YonghaoTrivedi, KrutarthHu, WalterJu, B. -KLee, Jeong-Bong2014-10-032014-10-032014-04-29Choi, K. -H, J. Huh, Y. Cui, K. Trivedi, et al. 2014. "One-step combined-nanolithography-and-photolithography for a 2D photonic crystal TM polarizer." Micromachines 5(2): 228-238.2072-666Xhttp://hdl.handle.net/10735.1/4072Walter Hu is actually Wenchuang (Walter) Hu.Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.enCC BY 3.0 (Attribution)©2014 The Authorshttp://creativecommons.org/licenses/by/3.0/Photonic crystalsSiliconPhotolithographyTransverse magnetic polarizersarticle52228