Bonsu, R. O.Kim, H.O'Donohue, C.Korotkov, R. Y.McClain, K. R.Abboud, K. A.Ellsworth, Ashley A.Walker, Amy V.Anderson, T. J.McElwee-White, L.2014-09-102014-09-102014-04-30Bonsu, R. O., H. Kim, C. O'Donohue, R. Y. Korotkov, et al. 2014. "Partially fluorinated oxo-alkoxide tungsten(VI) complexes as precursors for deposition of WOx nanomaterials." Dalton Transactions 43(24): 9226-9233.1477-9234http://hdl.handle.net/10735.1/3997The partially fluorinated oxo-alkoxide tungsten(VI) complexes WO(OR) 4 [4; R = C(CH3)2CF3, 5; R = C(CH3)(CF3)2] have been synthesized as precursors for chemical vapour deposition (CVD) of WOx nanocrystalline material. Complexes 4 and 5 were prepared by salt metathesis between sodium salts of the fluoroalkoxides and WOCl4. Crystallographic structure analysis allows comparison of the bonding in 4 and 5 as the fluorine content of the fluoroalkoxide ligands is varied. Screening of 5 as a CVD precursor by mass spectrometry and thermogravimetric analysis was followed by deposition of WOx nanorods.en©2014 The Royal Society of Chemistry. This article may not be further made available or distributed.WOx nanomaterialsLigandsChemical vapor deposition (CVD)Tetramethylsilanearticle43249226