Overzet, Lawrence JGoeckner, Matthew J2017-09-202017-09-202017-082017-08August 201http://hdl.handle.net/10735.1/5516The use of pulsed plasmas is currently being studied for integrated circuit fabrication as it may reduce defects and allow for processing optimization. It is therefore necessary to study pulsed plasmas, gaining understanding of the time dependence of important plasma parameters. One common method to measure many of these important plasma parameters is with a Langmuir probe. However, the pulsed plasma environment can cause difficulties in resolving correct values of these plasma parameters. This thesis gives a method for using Langmuir probes in pulsed plasma. More specifically, this thesis provides methods to set proper voltage and timing collection parameters needed to produce correct results. Further, this thesis provides an understanding of how a sheath resistance compensated probe must be constructed to accurately measure rapid changes to a plasma.application/pdfenCopyright ©2017 is held by the author. Digital access to this material is made possible by the Eugene McDermott Library. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.Pulse techniques (Electronics)Plasma engineeringLangmuir probesElectrostaticsThesis2017-09-20