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    • Erik Jonsson School of Engineering and Computer Science
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    • Wallace, Robert M.
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    In Situ Study of E-Beam Al And Hf Metal Deposition on Native Oxide InP (100)

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    ECS-FR-RMWallace-309519.44.pdf (1.930Mb)
    Author
    Dong, Hong
    Santosh, KC
    Azcatl, Angelica
    Cabrera, Wilfredo
    Qin, Xiaoye
    Brennan, Barry
    Zhernokletov, Dmitry
    Cho, Kyeongjie
    Wallace, Robert M.
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    Abstract
    Abstract
    The interfacial chemistry of thin Al (∼3 nm) and Hf (∼2 nm) metal films deposited by electron beam (e-beam) evaporation on native oxide InP (100) samples at room temperature and after annealing has been studied by in situ angle resolved X-ray photoelectron spectroscopy and low energy ion scattering spectroscopy. The In-oxides are completely scavenged forming In-In/In-(Al/Hf) bonding after Al and Hf metal deposition. The P-oxide concentration is significantly decreased, and the P-oxide chemical states have been changed to more P-rich oxides upon metal deposition. Indium diffusion through these metals before and after annealing at 250 °C has also been characterized. First principles calculation shows that In has lower surface formation energy compared with Al and Hf metals, which is consistent with the observed indium diffusion behavior.
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    http://hdl.handle.net/10735.1/3649
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    • Cho, Kyeongjae
    • JECS Staff and Student Research
    • Wallace, Robert M.

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