Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials

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Abstract

The partially fluorinated oxo-alkoxide tungsten(VI) complexes WO(OR) 4 [4; R = C(CH3)2CF3, 5; R = C(CH3)(CF3)2] have been synthesized as precursors for chemical vapour deposition (CVD) of WOx nanocrystalline material. Complexes 4 and 5 were prepared by salt metathesis between sodium salts of the fluoroalkoxides and WOCl4. Crystallographic structure analysis allows comparison of the bonding in 4 and 5 as the fluorine content of the fluoroalkoxide ligands is varied. Screening of 5 as a CVD precursor by mass spectrometry and thermogravimetric analysis was followed by deposition of WOx nanorods.

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Keywords

WOx nanomaterials, Ligands, Chemical vapor deposition (CVD), Tetramethylsilane

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National Science Foundation (CHE-1213965)

Rights

©2014 The Royal Society of Chemistry. This article may not be further made available or distributed.

Citation

Bonsu, R. O., H. Kim, C. O'Donohue, R. Y. Korotkov, et al. 2014. "Partially fluorinated oxo-alkoxide tungsten(VI) complexes as precursors for deposition of WOx nanomaterials." Dalton Transactions 43(24): 9226-9233.