Partially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterials

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dc.contributor.ISNI0000 0001 3758 9240 (Walker, AV)
dc.contributor.authorBonsu, R. O.en_US
dc.contributor.authorKim, H.en_US
dc.contributor.authorO'Donohue, C.en_US
dc.contributor.authorKorotkov, R. Y.en_US
dc.contributor.authorMcClain, K. R.en_US
dc.contributor.authorAbboud, K. A.en_US
dc.contributor.authorEllsworth, Ashley A.en_US
dc.contributor.authorWalker, Amy V.en_US
dc.contributor.authorAnderson, T. J.en_US
dc.contributor.authorMcElwee-White, L.en_US
dc.date.accessioned2014-09-10T18:27:37Z
dc.date.available2014-09-10T18:27:37Z
dc.date.created2014-04-30
dc.description.abstractThe partially fluorinated oxo-alkoxide tungsten(VI) complexes WO(OR) 4 [4; R = C(CH3)2CF3, 5; R = C(CH3)(CF3)2] have been synthesized as precursors for chemical vapour deposition (CVD) of WOx nanocrystalline material. Complexes 4 and 5 were prepared by salt metathesis between sodium salts of the fluoroalkoxides and WOCl4. Crystallographic structure analysis allows comparison of the bonding in 4 and 5 as the fluorine content of the fluoroalkoxide ligands is varied. Screening of 5 as a CVD precursor by mass spectrometry and thermogravimetric analysis was followed by deposition of WOx nanorods.en_US
dc.description.sponsorshipNational Science Foundation (CHE-1213965)en_US
dc.identifier.citationBonsu, R. O., H. Kim, C. O'Donohue, R. Y. Korotkov, et al. 2014. "Partially fluorinated oxo-alkoxide tungsten(VI) complexes as precursors for deposition of WOx nanomaterials." Dalton Transactions 43(24): 9226-9233.en_US
dc.identifier.issn1477-9234en_US
dc.identifier.issue24en_US
dc.identifier.startpage9226en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/3997
dc.identifier.volume43en_US
dc.language.isoenen_US
dc.publisherRoyal Society of Chemistryen_US
dc.relation.urihttp://dx.doi.org/10.1039/c4dt00407hen_US
dc.rights©2014 The Royal Society of Chemistry. This article may not be further made available or distributed.en_US
dc.source.journalDalton Transactionsen_US
dc.subjectWOx nanomaterialsen_US
dc.subjectLigandsen_US
dc.subjectChemical vapor deposition (CVD)en_US
dc.subjectTetramethylsilaneen_US
dc.titlePartially Fluorinated Oxo-Alkoxide Tungsten(VI) Complexes as Precursors for Deposition of WOx Nanomaterialsen_US
dc.type.genrearticleen_US

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