One-Step Combined-Nanolithography-And-Photolithography for a 2d Photonic Crystal TM Polarizer

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dc.contributor.authorChoi, Kyung-Haken_US
dc.contributor.authorHuh, J.en_US
dc.contributor.authorCui, Yonghaoen_US
dc.contributor.authorTrivedi, Krutarthen_US
dc.contributor.authorHu, Walteren_US
dc.contributor.authorJu, B. -Ken_US
dc.contributor.authorLee, Jeong-Bongen_US
dc.date.accessioned2014-10-03T20:02:18Z
dc.date.available2014-10-03T20:02:18Z
dc.date.created2014-04-29
dc.descriptionWalter Hu is actually Wenchuang (Walter) Hu.en_US
dc.description.abstractPhotonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.en_US
dc.identifier.citationChoi, K. -H, J. Huh, Y. Cui, K. Trivedi, et al. 2014. "One-step combined-nanolithography-and-photolithography for a 2D photonic crystal TM polarizer." Micromachines 5(2): 228-238.en_US
dc.identifier.issn2072-666Xen_US
dc.identifier.issue2en_US
dc.identifier.startpage228en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/4072
dc.identifier.volume5en_US
dc.language.isoenen_US
dc.publisherMDPI AGen_US
dc.relation.urihttp://dx.doi.org/10.3390/mi5020228en_US
dc.rightsCC BY 3.0 (Attribution)en_US
dc.rights©2014 The Authorsen_US
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/en_US
dc.source.journalMicromachinesen_US
dc.subjectPhotonic crystalsen_US
dc.subjectSiliconen_US
dc.subjectPhotolithographyen_US
dc.subjectTransverse magnetic polarizersen_US
dc.titleOne-Step Combined-Nanolithography-And-Photolithography for a 2d Photonic Crystal TM Polarizeren_US
dc.type.genrearticleen_US

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Lee, Jeong-Bong
Hu, Wenchuang‏ (Walter)
JECS Staff and Student Research