Trimethyl-Aluminum and Ozone Interactions with Graphite in Atomic Layer Deposition of Al2O3

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dc.contributor.authorMcDonnell, Stephenen_US
dc.contributor.authorPirkle, Adam R.en_US
dc.contributor.authorKim, Jiyoungen_US
dc.contributor.authorColombo, Luigien_US
dc.contributor.authorWallace, Robert M.en_US
dc.date.accessioned2014-02-19T23:35:34Z
dc.date.available2014-02-19T23:35:34Z
dc.date.created2012-11-21en_US
dc.description.abstractA study of the chemical interactions between the atomic layer deposition (ALD) Al2O3 precursors trimethlyaluminum (TMA) and ozone (TMA/O-3) and sp(2) carbon surfaces is presented. In-situ x-ray photoelectron spectroscopy is used to study these interactions, while ex-situ atomic force microscopy (AFM) is used to monitor the surface morphology. Ozone functionalization of the sp(2) carbon surface is discussed and the dependence of TMA/O-3 reactions over a range of ALD process conditions is examined. The utilization of a 6-cycle room temperature TMA/O-3 ALD seed layer to nucleate the conformal growth of Al2O3 by TMA/H2O at 200 degrees C as well as the quality of such films is discussed. Two stages of ozone reactions are observed: first the ozone appears to remove adsorbed species from the graphite surface before reacting with the surface. The deposition of Al2O3 is found to be strongly dependant on the N-2 purge time as well as the precursor pulse sequence. It is shown that the quality of these low temperature deposited films can easily be improved by removal of carbon containing species through an 300 degrees C anneal.en_US
dc.identifier.citationMcDonnell, Stephen, Adam R. Pirkle, Jiyoung Kim, Luigi Colombo, et al. 2012. "Trimethyl-aluminum and ozone interactions with graphite in atomic layer deposition of Al2O3." Journal of Applied Physics 112(104110).en_US
dc.identifier.issn0021-8979en_US
dc.identifier.issue10en_US
dc.identifier.startpage104110en_US
dc.identifier.urihttp://hdl.handle.net/10735.1/3063
dc.identifier.volume112en_US
dc.relation.urihttp://dx.doi.org/10.1063/1.4766408en_US
dc.rights© 2012 American Institute of Physicsen_US
dc.source.journalJournal of Applied Physicsen_US
dc.subjectGrapheneen_US
dc.subjectDielectricsen_US
dc.subjectAtomic force microscopyen_US
dc.subjectOzone layeren_US
dc.subjectPhotoelectronsen_US
dc.titleTrimethyl-Aluminum and Ozone Interactions with Graphite in Atomic Layer Deposition of Al2O3en_US
dc.typetexten_US
dc.type.genrearticleen_US

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