Static and Dynamic Characterization of a 3.3 kV, 45 A 4H-SiC MOSFET

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dc.contributor.authorAnurag, A.
dc.contributor.authorGohil, Ghanshyamsinh
dc.contributor.authorAcharya, S.
dc.contributor.authorHan, K.
dc.contributor.authorVechalapu, K.
dc.contributor.authorBaliga, B. J.
dc.contributor.authorBhattacharya, S.
dc.contributor.authorVan brunt, E.
dc.contributor.authorSabri, S.
dc.contributor.authorHull, B.
dc.contributor.authorGrider, D.
dc.contributor.utdAuthorGohil, Ghanshyamsinh
dc.date.accessioned2019-10-11T21:57:18Z
dc.date.available2019-10-11T21:57:18Z
dc.date.created2018-06-05
dc.descriptionFull text access from Treasures at UT Dallas is restricted to current UTD affiliates (use the provided Link to Article).
dc.description.abstractWide bandgap materials such as Silicon Carbide (SiC) has enabled the use of medium voltage unipolar devices like Metal-Oxide Field Effect Transistors (MOSFETs) and Junction Field Effect Transistors (JFETs), which can switch at much higher frequencies as compared to their silicon counterparts. It is therefore imperative to evaluate the performance of these medium voltage devices. In this paper, the static characterization and the switching performance of the new single die 3.3 kV, 45 A 4H-SiC MOSFET developed by Cree Inc are presented. The switching performance is measured through the conventional Double Pulse Test (DPT). Testing is done at a dc-link voltage of 1.5 kV for different values of current, and gate resistances. ©2018 Trans Tech Publications, Switzerland.
dc.description.departmentErik Jonsson School of Engineering and Computer Science
dc.identifier.bibliographicCitationAnurag, A., G. Gohil, S. Acharya, K. Han, et al. 2018. "Static and dynamic characterization of a 3.3 kV, 45 A 4H-SiC MOSFET." Materials Science Forum 924: 739-742, doi: 10.4028/www.scientific.net/MSF.924.739
dc.identifier.issn9783035711455
dc.identifier.urihttps://hdl.handle.net/10735.1/6995
dc.identifier.volume924
dc.language.isoen
dc.publisherTrans Tech Publications Ltd
dc.relation.urihttp://dx.doi.org/10.4028/www.scientific.net/MSF.924.739
dc.rights©2018 Trans Tech Publications, Switzerland.
dc.source.journalMaterials Science Forum
dc.subjectMetal oxide semiconductor field-effect transistors
dc.subjectSilicon carbide
dc.subjectPower transistors
dc.subjectWide gap semiconductors
dc.subjectField-effect transistors
dc.titleStatic and Dynamic Characterization of a 3.3 kV, 45 A 4H-SiC MOSFET
dc.type.genrearticle

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